Jobs / other
Lead Expert – Etch, Deposition, ALD & Metallization Metrology
Nearfield Instruments · Remote job
What you will do
Lead the identification of unmet metrology needs and critical process-control gaps in etch, deposition, ALD, and metallization.
Define the most valuable measurements, specifications, and use cases, including trench and via depth, sidewall profile, recess, footing, bowing, surface roughness, film conformality, step coverage, thickness uniformity, interface topography, and metal dishing or overburden.
Set application priorities and translate customer and manufacturing needs into product and technology roadmaps.
Lead engagement with customers, process engineers, and equipment partners to validate requirements and accelerate adoption.
Drive the development of metrology solutions that improve process control, yield, chamber matching, qualification time, and manufacturing performance.
Guide R&D and product teams on measurement performance, workflow integration, sampling strategies, and high-volume manufacturing requirements.
About the company
Nearfield Instruments (NFI) is a fast-growing, high-tech scale-up. We design, develop, integrate, market, and service advanced metrology machines. Our solutions enable the world’s leading chipmakers to increase production yield and improve device performance—powering smaller, faster, and more energy-efficient electronics.
Nearfield brings together leading experts in science and engineering to develop a unique, high-throughput Scanning Probe Microscopy (SPM) platform delivering true 3D, sub-nanometer resolution metrology at production scale.
We are looking for a senior semiconductor expert with deep experience in etching, thin-film deposition, atomic layer deposition (ALD), and metallization, gained within a leading-edge fab, research institute, or semiconductor equipment company.
This expert will lead Nearfield Instruments’ application and technology direction for advanced patterning, thin-film formation, conformal deposition, and metal integration. The role will identify the most critical process-control challenges, translate them into clear metrology requirements, and drive the development of new applications, capabilities, and product features that create greater value for customers.